Olympus DUV-KIT-2-2 microscope lens

Product Manual：

Olympus DUV-KIT-2-2 microscope lens
Introduction: OLYMPUS DUV-KIT-2-2 is a semiconductor detection specific deep ultraviolet microscope lens kit, suitable for detecting micro defects in wafers and masks
Suitable for 248nm deep ultraviolet band, with resolution far exceeding ordinary visible light lenses
Full path color difference correction, high imaging contrast and clear details
Non adhesive lens structure, long-term UV irradiation performance does not deteriorate
High transparency quartz lens with low light loss and easily recognizable weak defects
Low stray light design to avoid misjudging minor circuit defects
High numerical aperture, capable of resolving micro patterns at the hundred nanometer level
Clean grade sealed tube, suitable for dust-free semiconductor workshops

Anti UV coating, resistant to long-term high-intensity UV exposure
Standard mount, Olympus microscope can be directly replaced with the same specifications
Adequate working distance, less likely to scratch wafer samples during testing
Suppress glare reflection and adapt to low reflection metal line detection
Complete set of integrated optical path components, easy to disassemble and debug
Seismic resistant mirror body, equipment platform moving imaging without displacement
Adapt to multiple observation modes in both bright and dark fields
Industrial optical components, supporting 7 × 24-hour continuous quality inspection
Summary: OLYMPUS DUV-KIT-2-2 deep ultraviolet imaging has high accuracy, durability, and stability, and is a core optical component for semiconductor micro detection

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DUV-KIT-2-2

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