Daihen 3D39-000004-V2 RF Automatic Matcher
Product Manual：
Daihen 3D39-000004-V2 RF Automatic Matcher
Introduction: Daihen 3D39-000004-V2 is a specialized automatic RF matching unit for TEL semiconductor etching and coating machines, which dynamically adjusts the plasma impedance of the cavity to ensure stable RF power transmission.
Suitable for 60MHz high-frequency, 5kW RF power supply, compatible with advanced process technology
Fast automatic tuning, plasma impedance fluctuation can quickly complete matching
Significantly reducing reflected power, effectively protecting the RF host from burns
Internal copper RF channel with low power transmission loss and good thermal conductivity
Integrated water-cooled heat dissipation, high load long-term operation without high temperature alarm
Digital communication interface, capable of real-time interaction of process data with the machine master control
Real time monitoring of standing waves, power, and temperature, with immediate feedback and alarm for any abnormalities
Multiple safety protections against overheating, overcurrent, and high standing waves to reduce shutdown failures
Precision adjustable capacitor inductor module with high impedance matching control accuracy
Process parameter power-off memory, restart without recalibrating matching curve
Metal sealed dust-proof chamber, suitable for dust-free clean workshop conditions
Standardized docking terminals and RF interfaces, easy and quick disassembly and replacement
Strong resistance to electromagnetic interference, multiple RF devices operating in the same cabinet do not affect each other
Organize modular layout to save installation space inside the cabinet
Original factory compatible TEL series machines, directly compatible for use on the machine
Conclusion: Daihen 3D39-000004-V2 has a fast matching response and strong process stability, making it a core RF spare part for semiconductor thin films and etching equipment.
Product detailed pictures：
3D39-000004-V2
product video
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