Edwards EUV3050H vacuum dry pump  

Product Manual：

Edwards EUV3050H
1. Equipped with EUV lithography machine as a front dry suction pump
2. Oil free operation throughout the entire process, without contaminating the internal cavity of the lithography
3. Efficient extraction of hydrogen and process waste gases in the manufacturing process
4. The operation vibration is minimal and does not affect the precision exposure operation of photolithography
5. Internal cavity corrosion-resistant material, suitable for special process gases
6. Equipped with a self-cleaning design to reduce internal dust accumulation and blockage
7. Automatic power reduction during idle working conditions to save energy consumption
8. Real time monitoring of temperature, load, pressure and other operational status

9. Automatic shutdown protection in case of overload or high temperature faults
10. Support remote access to the factory control system to view data
11. The overall structure is compact, occupying less space in the clean workshop
12. No need to replace lubricating oil, low daily maintenance workload
13. Easy disassembly and assembly, quick replacement in case of equipment failure
14. Specially optimized hydrogen extraction efficiency, integrated with photolithography process
15. Can carry out mass production and air extraction work continuously and stably for a long time
Summary: Edwards EUV3050H is a specialized dry pump for EUV lithography, which builds a basic pre vacuum to meet the clean and stable pumping needs of advanced chip production lines

Product detailed pictures：

EUV3050H

product video

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