Lam 660-178383-001 RF Generator
Product Manual：
Lam 660-178383-001
1. Adapt to the Panlin etching machine, output RF energy to excite the plasma inside the process chamber
2. Real time collection of forward and reflected power, automatic matching of cavity load impedance
3. High precision power regulation ensures uniform and stable etching morphology of the wafer
4. Automatic locking and power-off protection against excessive standing wave, overload, and high temperature anomalies
5. Water cooling and heat dissipation design, stable and controllable temperature rise during long-term full load production
6. Shielding circuit to resist workshop electromagnetic interference, signal output is not easily offset
7. Docking with the equipment master, remotely setting power and process start stop timing
8. Output waveform is pure, reducing the impact of harmonic interference on process stability
9. Modular plug-in structure, high efficiency in disassembling and replacing faulty machines
10. Meet the standards for dust-proof and anti-static use in dust-free workshops
11. Support pulse power output and adapt to fine high aspect ratio etching processes
12. Record operating parameters throughout the process for easy fault tracing and daily inspection
13. Adapt to plasma conditions corresponding to fluorine-containing corrosive process gases
14. The whole machine operates with minimal vibration and will not interfere with the precise positioning of the cavity
15. Daily maintenance only requires checking the RF cable connectors and cooling water circuit
Summary: Lam 660-178383-001 is the original RF generator of the Panlin etching equipment, which stably drives plasma etching operations and is the core power supply accessory of the chip dry etching production line.
Product detailed pictures：
660-178383-001
product video
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