GENESIS 27-406204-00 RF Generator  

Product Manual：

#GENESIS 27-406204-00 RF Generator

1. Semiconductor dry etching plasma stable power supply drive
2. PECVD dielectric thin film deposition RF energy output
3. PVD insulation material sputtering power supply
4. Remote plasma chamber cleaning RF energy output
5. Crystal round photoresist plasma dry stripping power supply
6. ALD atomic layer deposition precision plasma power supply
7. Third generation semiconductor cavity etching RF power supply
8. Panel TFT thin film etching stabilizes plasma excitation
9. Deposition of passivation film on photovoltaic cells for RF power supply
10. Power supply through plasma activation modification of wafer surface

11. Cleaning of optical coating chamber with plasma power supply
12. Power supply for plasma surface cleaning before chip packaging
13. Fluorine based process gas dissociation excitation power output
14. Laboratory vacuum plasma material processing power supply
15. This GENESIS 27-406204-00 is an AE original GENESIS series RF host, which comes with fast arc extinguishing and adaptive impedance adjustment to reduce reflected power loss
Overall, GENESIS 27-406204-00 has high power control accuracy and strong resistance to load fluctuations, making it suitable for long-term uninterrupted precision plasma process operation in semiconductor production lines.

Product detailed pictures：

27-406204-00

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