MKS AX7700MTS-02 plasma source   

Product Manual：

MKS AX7700MTS-02 plasma source
1. MKS AX7700MTS-02 belongs to remote microwave plasma generation equipment
2. Using quartz cavity structure to generate high-density active free radicals
3. Support adaptation to various process gases such as O ₂, N ₂, Ar, etc
4. Closed loop power regulation, high output power accuracy, good process consistency
5. Rapid plasma ignition reduces equipment and process waiting time
6. EtherCAT communication interface, supporting high-speed data exchange between devices
7. Equipped with multiple interlocking protections for heat and water flow, the equipment has complete safety protection

8. High gas dissociation efficiency, improving chamber cleaning and processing efficiency
9. Continuous operation at full duty cycle, suitable for uninterrupted operation of semiconductor production lines
10. Compact overall structure, easy to integrate into the side end of the process chamber
11. Corrosion resistant material in wet areas, capable of withstanding strong plasma corrosion conditions
12. Built in status monitoring, capable of real-time reporting of operational and fault information
13. Water cooling and heat dissipation solution, stable temperature control under high-power working conditions
14. Support multiple MKS AX7700MTS-02 network expansion process capabilities
15. Compliant with safety related standards for semiconductor industry SEMI equipment
MKS AX7700MTS-02 plasma source, commonly used for semiconductor equipment cavity cleaning and wafer pretreatment, generates remote plasma active groups to complete process processing

Product detailed pictures：

AX7700MTS-02

product video

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