Daihen RMN-20E2-V RF Matcher

Product Manual：

Daihen RMN-20E2-V RF Matcher
Introduction: Daihen RMN-20E2-V semiconductor specific automatic RF matching device, suitable for etching and coating machines, responsible for automatic adjustment of RF impedance.
Suitable for 20kW power RF power supply, standard 13.56MHz frequency band
High speed automatic tuning, quickly offsetting plasma impedance fluctuations
Significantly reduce reflected power to protect the RF host from damage
Built in high-precision capacitor and inductor adjustment module, with high matching accuracy
Metal sealed chamber, suitable for clean working conditions in dust-free workshops
Equipped with a water-cooling heat dissipation structure, it can work continuously under high loads without heating up
Digital communication interface, capable of real-time linkage with the main control of the machine

Real time collection of standing wave data, rapid alarm prompt for abnormalities
Multiple safety protections against overheating, overcurrent, and high standing waves
Copper RF channel with lower power transmission loss
Process parameter power-off memory, restart without recalibration
Standardized docking port, easy disassembly and replacement, time-saving
Anti electromagnetic interference design, stable operation of multiple RF devices in the same cabinet
Compact integrated structure, saving cabinet installation space
Original factory program, matching curve to adapt semiconductor plasma process
Conclusion: Daihen RMN-20E2-V has fast matching response and stable power transmission, making it a core RF spare part for thin film and etching equipment.

Product detailed pictures：

RMN-20E2-V

product video

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