LAM 853-064887-010 Matcher  

Product Manual：

LAM 853-064887-010 Matcher
Specialized RF automatic matching device for Panlin etching equipment
Real time impedance adjustment to reduce RF reflection loss
Millisecond level fast tuning, stable cavity plasma
Real time collection of incident and reflected power data
Adapt to multiple sets of machine process formula switching
Built in overcurrent, overheating, and RF overload protection
Metal enclosed shell, dustproof and corrosion-resistant
Internal water cooling and heat dissipation, high-power continuous operation
Motor driven adjustable capacitor with high matching accuracy

Communication docking with the main control of the entire machine, parameters can be monitored
Low gas release material, suitable for vacuum clean environment
Seismic resistant structure, capable of withstanding long-term vibrations of equipment
Standard rack installation, easy disassembly and maintenance
Suppress clutter interference and achieve good process consistency
Compatible with LAM series plasma etching machine
Summary: LAM 853-064887-010 has fast RF matching tuning speed and stable operation, making it the core component of the RF system for semiconductor etching machines.

Product detailed pictures：

853-064887-010

product video

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