TEL 2L80-000952-V2 RF Filter  

Product Manual：

TEL 2L80-000952-V2 RF Filter
Introduction: TEL 2L80-000952-V2 is a specialized RF filtering component for Tokyo electronic etching machines, used to purify RF signals in the chamber.
Filter out RF clutter and stabilize plasma discharge process
High barrier attenuation, suppressing high-frequency harmonic interference
Low loss path ensures stable RF power output
Metal sealed shell, shielding electromagnetic leakage
Plasma corrosion-resistant material, suitable for dust-free chamber environment
Built in overcurrent protection to prevent damage to the board caused by RF impact
Standard RF connector, easy to disassemble and replace

Wide temperature tolerance, 24-hour continuous production without drift
Integrated packaging, earthquake resistant and anti loosening compatible with equipment vibration
Suppress signal crosstalk and improve wafer process uniformity
Compact size, suitable for small installation positions in cabinets
Epoxy resin encapsulation, moisture-proof, dustproof, and cleanroom resistant
Match TEL series dry etching semiconductor equipment
Reduce fluctuations in chamber process parameters and minimize defective products
Extend the service life of RF power supply and matching device
Conclusion: TEL 2L80-000952-V2 has strong filtering effect, durability and stability, and is a core component of the RF system for semiconductor etching equipment.

Product detailed pictures：

2L80-000952-V2

product video

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