TEL 2L80-000952-V2 RF Filter

دليل المنتج：

TEL 2L80-000952-V2 RF Filter
مقدمة: TEL 2L80-000952-V2 is a specialized RF filtering component for Tokyo electronic etching machines, used to purify RF signals in the chamber.
Filter out RF clutter and stabilize plasma discharge process
High barrier attenuation, suppressing high-frequency harmonic interference
Low loss path ensures stable RF power output
Metal sealed shell, shielding electromagnetic leakage
Plasma corrosion-resistant material, suitable for dust-free chamber environment
Built in overcurrent protection to prevent damage to the board caused by RF impact
Standard RF connector, من السهل تفكيكها واستبدالها

Wide temperature tolerance, 24-hour continuous production without drift
Integrated packaging, earthquake resistant and anti loosening compatible with equipment vibration
Suppress signal crosstalk and improve wafer process uniformity
حجم صغير, suitable for small installation positions in cabinets
Epoxy resin encapsulation, مقاوم للرطوبة, مقاوم للغبار, and cleanroom resistant
Match TEL series dry etching semiconductor equipment
Reduce fluctuations in chamber process parameters and minimize defective products
Extend the service life of RF power supply and matching device
خاتمة: TEL 2L80-000952-V2 has strong filtering effect, durability and stability, and is a core component of the RF system for semiconductor etching equipment.

صور مفصلة للمنتج：

2L80-000952-V2

فيديو المنتج

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