MKS T3BIA-28563 Control Valve

Product Manual：

MKS T3BIA-28563 Control Valve
Introduction: MKS T3BIA-28563 is used for pressure regulation in semiconductor vacuum chambers, with precise and stable adjustment
Integrated drive control structure, no need for additional supporting controllers
Closed loop pressure regulation, small overshoot, good process repeatability
High speed valve response, quickly reaching the set vacuum pressure
Compatible with multiple industrial communication protocols and compatible with production line controllers
Special corrosion-resistant seal, suitable for various process gases
The valve body has strong temperature resistance and is suitable for high temperature working conditions of the machine
Multiple electrical protections, automatic protection against overcurrent and overheating
Linear flow regulation, controllable slight pressure changes

Stainless steel valve body, clean and free of impurities contaminating the wafer
Low leakage sealing structure, excellent vacuum pressure holding effect
Compact body, space saving equipment pipeline installation
Built in fault feedback, quickly locate and adjust abnormalities
Long cycle life, reducing frequent replacement
Support dual pressure sensor integration for more precise regulation
Original factory matching parameters, this MKS T3BIA-28563 is compatible with vacuum etching thin film equipment
Conclusion: Stable control of cavity vacuum environment, spare parts for MKS T3BIA-28563 semiconductor process specific vacuum control valve

Product detailed pictures：

T3BIA-28563

product video

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