MKS T3BIA-28563 Control Valve

Руководство по продукту：

MKS T3BIA-28563 Control Valve
Введение: MKS T3BIA-28563 is used for pressure regulation in semiconductor vacuum chambers, with precise and stable adjustment
Integrated drive control structure, no need for additional supporting controllers
Closed loop pressure regulation, small overshoot, good process repeatability
High speed valve response, quickly reaching the set vacuum pressure
Compatible with multiple industrial communication protocols and compatible with production line controllers
Special corrosion-resistant seal, suitable for various process gases
The valve body has strong temperature resistance and is suitable for high temperature working conditions of the machine
Многочисленная электрическая защита, automatic protection against overcurrent and overheating
Linear flow regulation, controllable slight pressure changes

Корпус клапана из нержавеющей стали, clean and free of impurities contaminating the wafer
Low leakage sealing structure, excellent vacuum pressure holding effect
Компактный корпус, space saving equipment pipeline installation
Built in fault feedback, quickly locate and adjust abnormalities
Long cycle life, reducing frequent replacement
Support dual pressure sensor integration for more precise regulation
Original factory matching parameters, this MKS T3BIA-28563 is compatible with vacuum etching thin film equipment
Заключение: Stable control of cavity vacuum environment, spare parts for MKS T3BIA-28563 semiconductor process specific vacuum control valve

Подробные фотографии продукта：

T3BIA-28563

видео о продукте

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