إدواردز ACF31B122300 مضخة فراغ التجفيف
دليل المنتج：
إدواردز ACF31B122300 مضخة فراغ التجفيف
1. Establishment of primary vacuum through rough pumping of semiconductor process chamber in advance
2. Quick release of atmospheric pressure gas from the lock chamber of the coating equipment
3. The etching process smoothly extracts the exhaust gas generated by the process
4. The molecular pump is paired with a front-end pump to provide basic negative pressure for the high vacuum unit
5. The wafer cleaning station extracts water vapor and volatile pollutants from the chamber
6. The dust-free workshop operates without oil throughout the entire process, preventing oil contamination of the chamber
7. Suitable for gas extraction operations in mildly corrosive processes
8. On site dismantling, استبدال, commissioning and production of old and identical dry pumps
9. Low vibration during operation will not interfere with the precise positioning of the machine
10. Installation verification of extraction rate, body temperature rise, and exhaust pressure
11. No need to add lubricating oil, eliminating the need for regular oil change and maintenance steps
12. Continuous and stable load operation under full day production conditions for a long time
13. Automatic shutdown protection mechanism triggered when temperature and load are abnormal
14. Daily basic maintenance can be completed by simply cleaning the intake filter element
15. Photovoltaic coating and optical vapor deposition supporting vacuum pre pumping operation
The Edwards ACF31B122300 dry oil-free vacuum pump is used as a front-end pumping equipment for semiconductor vacuum systems, with high cleanliness and simple operation and maintenance, suitable for normal production on production lines and replacement of faulty spare parts.
صور مفصلة للمنتج：
ACF31B122300
فيديو المنتج
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