AMAT 0090-36276 Semiconductor Reactor
Product Manual：
AMAT 0090-36276 Reactor
1. Semiconductor process specific cavity reactor components
2. Adapt to the environment of wafer thin film deposition process
3. Corrosion resistance inside the cavity, resistant to process gas erosion
4. Precise sealing structure ensures high vacuum state of the cavity
5. Stable temperature control structure, achieving uniform temperature field in the cavity
6. Gas channel design to ensure balanced distribution of process gases
7. Equipped with pressure monitoring interface, real-time monitoring of pressure inside the chamber
8. Modular cavity structure, easy disassembly and maintenance
9. Compatible with RF and vacuum systems for collaborative operation
10. Anti plasma corrosion, long service life of components
11. Reserve sensor installation positions and collect process parameters
12. Compatible with reaction environments for multiple types of process gases
13. Strict dimensional tolerances ensure wafer process consistency
14. Support cavity cleaning and maintenance to reduce particle pollution
15. Adapt to semiconductor manufacturing etching and deposition process workstations
The AMAT 0090-36276 reactor is a core reaction chamber component of semiconductor equipment used for thin film processing of wafers.
Product detailed pictures：
0090-36276
product video
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