Novellus 27-033321-00 Turbomolecular Pump
Product Manual：
Novellus 27-033321-00 Turbomolecular Pump
1. Novellus High Vacuum Turbomolecular Pump for Thin Film Equipment
2. High speed rotor impeller, obtaining ultra-high vacuum environment in the cavity
3. Excellent rotor dynamic balance and low operating vibration amplitude
4. Resistant to minor process by-products and compatible with CVD processes
5. Built in bearing status monitoring, predicting component aging
6. Equipped with multiple protections for over speed, over temperature, and overload
7. Real time collection of operating parameters such as speed and temperature
8. Complete communication interfaces, compatible with the main control system of the machine
9. Alarm signal output, abnormal upload to the whole machine interlock
10. Oil and gas isolation design to prevent oil vapor from flowing back into the chamber
11. Support long-term uninterrupted semiconductor mass production operation
12. Store operation and fault logs for easy maintenance and troubleshooting
13. Water cooled cooling structure, suitable for high temperature environment of cabinets
14. Flange standard specifications, reliable vacuum sealing performance
15. Modular structure, convenient on-site disassembly and replacement
Novellus 27-033321-00 turbo molecular pump, Novellus deposition equipment high vacuum acquisition unit, combined with the front-end pump to establish ultra-high vacuum in the chamber, ensuring the stability of thin film process.
Product detailed pictures：
27-033321-00
product video
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