SHIMADZU TMP-3403LMC-T4 Turbomolecular Pump
Product Manual：
#SHIMADZU TMP-3403LMC-T4 Turbomolecular Pump
1. Continuous high vacuum maintenance of large-sized LCD panel coating chamber
2. Corrosion process gas extraction in semiconductor wafer etching process
3. Online secondary ion mass spectrometer with ultra-high vacuum chamber voltage stabilization
4. Vacuum pumping operation for wide bandgap semiconductor material MOCVD epitaxial growth
5. Continuous vacuum evaporation production line for low radiation coated glass in buildings
6. Corrosion resistant coating for hard cutting tools, chemical vapor deposition, vacuum pumping
7. Sealed vacuum replacement treatment of deuterium tritium gas in nuclear fusion test chamber
8. High temperature vacuum stress relief annealing of large aviation structural components as a whole
9. Construction of high flow benchmark vacuum for industrial online helium detection equipment
10. Extraction of large-area thin film deposition cavity for perovskite photovoltaic modules
11. Special rare metal high-purity smelting closed vacuum purification process
12. Construction of ultra-high vacuum environment for research synchrotron radiation beamline station
13. Vacuum baking and degassing process for high-precision inertial components in vehicles
14. Industrial batch coating and vacuum supply of optical multilayer dielectric films
15. This SHIMADZU TMP-3403LMC-T4 turbo molecular pump is suitable for mass production vacuum production lines with high flow rates and corrosive gases
In summary, SHIMADZU TMP-3403LMC-T4 has excellent corrosion resistance, strong bearing capacity at high pumping speeds, low vibration during magnetic levitation structure operation, and outstanding stability under long-term mass production conditions.
Product detailed pictures：
TMP-3403LMC-T4
product video
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