AMAT 0010-C0376 Vacuum Pump

Руководство по продукту：

AMAT 0010-C0376 Vacuum Pump Product Features
Введение: AMAT 0010-C0376 is a dry vacuum pump that is compatible with semiconductor equipment, suitable for thin film deposition processes, and has stable vacuum output.
Dry oil-free structure to avoid oil contamination in wafer manufacturing process
Stable pumping speed output, quickly achieving the required vacuum degree for the process
Corrosion resistant chamber, capable of extracting process corrosive gases
Built in temperature control and heat dissipation system, continuous operation for a long time without high temperature
Low vibration operation reduces the overall vibration deviation of the equipment
Equipped with gas filtration components to prevent dust from entering the pump body
Standard adaptation to AMAT original coating equipment, direct replacement

Multiple safety protections for motor overload and overvoltage
Integrated signal feedback interface, compatible with device control systems
Компактный корпус, saving installation space inside the machine
Wear resistant rotor components significantly extend the service life of the entire machine
Noise reduction optimization structure, lower workshop operation noise
Compatible with multiple types of process gases, с сильной универсальностью
Модульная разборка и сборка, simple maintenance and replacement steps
Промышленный широкий диапазон температур, suitable for clean factory environment
Заключение: AMAT 0010-C0376 is clean, прочный, and suitable for semiconductor production lines. It is a standard vacuum component for coating equipment.

Подробные фотографии продукта：

0010-C0376

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