Edwards NRY4JC000XS vacuum pump
Руководство по продукту：
Edwards NRY4JC000XS vacuum pump
1. Continuous vacuuming operation of semiconductor wafer etching chamber
2. JEOL Scanning Electron Microscope Front Stage Vacuum Environment Construction
3. Internal negative pressure stable operation of thin film deposition process
4. Dust free workshop ion implantation equipment supporting gas extraction
5. Rapid pre extraction of air from the cavity of the electron beam detection instrument
6. Clean and oil-free pumping operation for photovoltaic silicon wafer coating process
7. Laboratory material analysis instrument vacuum chamber gas supply
8. On site disassembly and replacement of faulty vacuum pumps on old production lines
9. Smooth suction treatment and emission of PECVD process exhaust gas
10. Construction of High Clean Vacuum Environment for Chip Packaging Process
11. Equipment installation, отладка, vacuum degree parameter calibration and calibration
12. Mild corrosive process gas adaptation suction operation
13. The production line operates continuously throughout the day with stable air extraction
14. Regular maintenance of instruments, replacement of pump body seals and vulnerable parts
15. Preparation of Vacuum Environment for Optical Coating Equipment Chamber
Edwards NRY4JC000XS vacuum pump is commonly used for vacuum extraction in semiconductor precision processes, research electron microscopy equipment, and on-site spare parts replacement and maintenance operations
Подробные фотографии продукта：
NRY4JC000XS
видео о продукте
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