GHW55A-13DF4L0-002 RF Generator

Руководство по продукту：

GHW55A-13DF4L0-002 RF Generator
1. Fine plasma etching power supply for storage chip trench structure
2. Stable excitation of intracavity plasma in silicon-based thin film deposition process
3. Plasma dry cleaning operation for impurities on the surface of screen substrate
4. Activation treatment of substrate surface before power chip packaging for power supply
5. Plasma cleaning processing of the surface of the sample to be tested by the testing instrument
6. Deposition of passivation film on photovoltaic silicon wafer with constant RF energy input
7. Optical Lens Anti reflective Coating Sputtering Process Ignition Drive

8. Damaged production line, overall disassembly, замена, and debugging of equipment of the same specifications
9. Automatically activate safety protection when abnormal load fluctuations occur
10. On site debugging of power size and working timing according to process requirements
11. Stable operation in a fixed frequency band to avoid frequency offset issues
12. Real time matching of cavity impedance to reduce unnecessary power loss
13. The mass production workshop works continuously for a long time to ensure uniform process effects
14. Regularly check the internal power components and wiring tightness
15. Micro device micro etching process outputs stable RF energy
GHW55A-13DF4L0-002 RF generator is suitable for plasma processing processes related to semiconductors, photovoltaics, and optical coatings. It can be used for daily production power supply and maintenance of faulty equipment

Подробные фотографии продукта：

GHW55A-13DF4L0-002

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