HF 3156360-015 RF Generator

Руководство по продукту：

HF 3156360-015
1. Dedicated RF power supply for semiconductor equipment, outputting high-frequency electrical energy to excite plasma inside the cavity
2. Real time collection of forward and reflected power, automatic matching of cavity load impedance
3. Accurately adjust the output power to ensure stable etching and coating process parameters
4. Automatic power-off protection in case of overheating, high standing wave, and abnormal overload
5. Built in filtering circuit to resist electromagnetic interference from workshop power grid
6. Water cooled cooling structure, controllable temperature rise during long-term mass production operation
7. Docking with the main control system of the machine, remotely setting power and operation timing
8. The output waveform is regular, the power control accuracy is high, and the process effect is stable
9. Модульная структура плагина, easy disassembly and replacement of faulty machines

10. Suitable for clean environments in dust-free workshops, with dust-proof and oil proof design
11. Can work continuously and stably under load 24/7 без перерыва
12. Comes with operational data records for easy troubleshooting and maintenance in the future
13. Suitable for wafer dry etching and cavity plasma cleaning processes
14. Daily maintenance only requires checking the wiring connectors and cooling water circuit
15. Suitable for use with mainstream 300mm wafer processing machines
Краткое содержание: HF 3156360-015 is a core RF generator in semiconductor processes, which stably supplies RF energy to generate plasma and ensures the smooth mass production operation of chip coating and etching processes.

Подробные фотографии продукта：

3156360-015

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