Hitachi M-05A2LS-400K RF Controller
Руководство по продукту：
Hitachi M-05A2LS-400K RF Controller
Hitachi M-05A2LS-400K is a dedicated RF control unit for semiconductor etching and coating equipment, with stable power output and suitable for plasma process conditions.
1. 400K standard RF frequency band, matched with Hitachi original vacuum process equipment
2. Accurate and adjustable output power, minimal power fluctuations, and high process consistency
3. Built in automatic impedance matching, quickly adapting to various plasma loads
4. Integrated multiple safety protections for overcurrent, перенапряжение, и перегрев
5. Short circuit instantaneous cut-off output to prevent damage to the cavity and RF source
6. Built in EMI filtering circuit to suppress RF interference equipment signals
7. Small modular body, cabinet rail installation saves space
8. Specialized high-frequency shielding shell to prevent RF leakage and contamination of the process
9. Optimize air duct heat dissipation, controllable temperature rise during long-term full load operation
10. Сбор цифрового сигнала, real-time feedback of power and standing wave data
11. Стандартный интерфейс связи, capable of interfacing with the main control system of the device for linkage
12. High clean industrial components, non-volatile and compatible with vacuum chambers
13. Anti vibration structure, the production line operates continuously and is not prone to poor contact
14. Panel malfunction indicator light, quickly troubleshoot RF abnormal issues
15. Plug in terminal block, easy to maintain and replace operation
В итоге, the Hitachi M-05A2LS-400K RF controller is matched with semiconductor plasma processes, with stable frequency and voltage control and complete protection. It is the core RF control component for vacuum film and etching equipment.
Подробные фотографии продукта：
М-05A2LS-400K
видео о продукте
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