MKS AX7670-19 Remote Plasma Source

Руководство по продукту：

MKS AX7670-19
1. Remote plasma cleaning device for semiconductor equipment cavity
2. Ionizing fluorine-containing gases produces active particles to remove scale inside the chamber
3. Plasma is generated outside the body and will not damage the wafer or the inner wall of the cavity
4. High gas decomposition efficiency, reducing the cleaning time of the chamber
5. Internal cavity made of corrosion-resistant material, compatible with corrosive cleaning gases
6. Water cooling and heat dissipation, stable and controllable temperature for long-term operation
7. Real time monitoring of power, airflow, and temperature operating status
8. Automatic shutdown protection for water shortage, перегрев, and abnormal gas supply

9. Компактный размер, flexible installation and layout, saving space
10. Remote start stop adjustment parameters for the main control system of the device that can be docked
11. Integrated design of the whole machine, simple and convenient wiring and assembly
12. Can cooperate with the production line around the clock for scheduled cavity maintenance and cleaning
13. Стабильная работа, will not interfere with normal production process flow
14. Convenient disassembly and replacement of faulty equipment, сокращение времени простоя
15. Commonly used for daily dry maintenance and cleaning of etching and coating equipment
Краткое содержание: MKS AX7670-19 is used for dust-free dry cleaning of semiconductor cavities, safely and efficiently removing impurities deposited on the inner walls, and is a key component for daily maintenance of production lines.

Подробные фотографии продукта：

AX7670-19

видео о продукте

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