MKS AX7700MTS-03 plasma source

Руководство по продукту：

#MKS AX7700MTS-03 plasma source

1. Online dry cleaning of ALD atomic layer deposition chamber
2. Cleaning of impurity fluorine based free radicals deposited on the chamber wall of CVD equipment
3. Remote plasma stripping of photoresist on storage chip production line
4. Gas activation dissociation of silicon carbide power device process
5. Daily periodic cleaning treatment of panel TFT process chamber
6. Decomposition and removal of organic residues in perovskite photovoltaic cavities
7. Purification treatment of trace pollutants on the surface of wafers before packaging
8. Plasma surface activation modification of quartz process accessories
9. Overall cleaning of sputtering residue inside the PVD coating machine chamber

10. Pre treatment of research vacuum chamber and plasma activation process
11. Removal of carbon deposits on the inner wall of third-generation semiconductor epitaxial furnaces
12. Gentle peeling of excess dielectric film layer in optical coating cavity
13. Harmless cleaning of scale accumulation on the inner wall of lithium film deposition chamber
14. Surface plasma cleaning and maintenance of chip testing vehicles
15. This MKS AX7700MTS-03 plasma source relies on remote excitation mode to avoid surface damage caused by direct ion bombardment on the wafer
Общий, MKS AX7700MTS-03 has high gas dissociation efficiency and minimal particle pollution, making it suitable for long-term stable online cleaning operations in high-end semiconductor production lines.

Подробные фотографии продукта：

AX7700MTS-03

видео о продукте

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