Spectrum 0190-22201 RF Generator
Руководство по продукту：
Spectrum 0190-22201 RF Generator
1. Semiconductor wafer dry etching plasma excitation power supply
2. Stable RF energy output during PECVD thin film deposition process
3. Plasma cleaning and activation treatment of wafer surface
4. Optical lens vacuum coating chamber plasma excitation supply
5. JEOL electron beam matching process cavity RF controlled power supply
6. Pre treatment of plasma surface modification before chip packaging
7. RF power driven operation for thin film layer growth of display panel
8. Complete disassembly and replacement of RF power supply with the same model due to production line malfunction
9. Power supply for laboratory new material plasma synthesis experiment
10. Real time matching and automatic adjustment control of high-frequency cavity impedance
11. Calibration of output power and frequency parameters for whole machine installation and debugging
12. Stable energy supply for insulation film deposition in low impurity environment
13. Continuous constant RF power output under 24-hour production conditions
14. Regular maintenance and inspection of aging and replacement of internal power modules
15. Supporting power supply for the deposition process of silicon nitride and silicon oxide dielectric layers
The Spectrum 0190-22201 RF generator is mainly used for supplying energy to various plasma processes in semiconductors, as well as for replacing faulty spare parts and daily operation and maintenance of equipment in use on production lines
Подробные фотографии продукта：
0190-22201
видео о продукте
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