Spectrum 0190-28942 RF Generator

Руководство по продукту：

Spectrum 0190-28942 RF Generator
1. Stable excitation of plasma in semiconductor process chamber
2. PVD coating on wafer dielectric layer provides precise RF power supply
3. Dry etching process regulates the plasma state inside the cavity
4. Plasma cleaning of substrate surface to remove oil and impurities
5. Dynamic impedance adaptation of the cavity to reduce power reflection loss
6. Standardized communication docking machine main control system remote control
7. Pulse power output controls wafer surface temperature rise
8. Production line malfunction, same model machine disassembly and replacement, machine debugging

9. Real time monitoring of changes in forward and reflected power values
10. Automatic protection shutdown for overload, перегрев, and standing wave anomalies
11. Stable output frequency to avoid process parameter drift
12. Long term continuous mass production and stable operation in the clean workshop
13. Segmented power timing setting adapted to the entire process flow
14. Regularly inspect RF cable connectors and internal amplifier components
15. Third generation semiconductor sample pretreatment plasma power supply
Spectrum 0190-28942 is a semiconductor factory matching RF power supply unit, used for coating, etching, surface treatment plasma excitation, and balancing daily production operation and spare parts replacement and maintenance.

Подробные фотографии продукта：

0190-28942

видео о продукте

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