DAIHEN 2L39-000158-V3 RF Automatic Matcher

دليل المنتج：

DAIHEN 2L39-000158-V3 RF Automatic Matcher Product Features
مقدمة: DAIHEN 2L39-000158-V3 is a specialized RF matching device for semiconductor etching and coating equipment, which can quickly adjust impedance and stabilize plasma processes.
Automatic real-time matching of load impedance, low RF transmission loss
Fast tuning response to adapt to dynamic changes in cavity impedance
Significantly reduce reflected power and protect the RF power supply host
Compatible with standard industrial RF frequencies and mainstream processes
Built in air-cooled heat dissipation, long-term full load operation without overheating
High voltage insulation protection to avoid RF leakage faults
Original factory standard interface, can directly replace spare parts of the same specification

Real time signal feedback for easy monitoring of machine system status
Compact modular body, توفير مساحة التثبيت داخل الجهاز
Corrosion resistant internal components, resistant to process corrosive gas environments
Multiple fault protection, automatic shutdown warning for overheating and overcurrent
اهتزاز منخفض أثناء التشغيل, does not interfere with precision semiconductor processes
Standardized communication protocol, integrated with TEL equipment control system
High durability adjustable capacitors and inductors, with longer maintenance cycles
The clean workshop is equipped with a sealed structure to prevent dust, ماء, and steam from entering
خاتمة: DAIHEN 2L39-000158-V3 has precise matching and complete protection, and is the core RF matching component of plasma semiconductor equipment.

صور مفصلة للمنتج：

2L39-000158-V3

فيديو المنتج

روابط أخرى

SEW DFS56L-TF-RH1M-KK伺服电机
NI SCXI-1104C数据采集模块
3BHE032025R0101 PCD235A101励磁机控制模块

روابط أخرى

07KT94 L GJR5252100R0161 وحدة تحكم منطقية
ب&R 8LSA35. E2060D000-0 servo motor
GDC801A 3BHE0247R0101 Control Board