DAIHEN 2L39-000158-V3 RF Automatic Matcher

Руководство по продукту：

DAIHEN 2L39-000158-V3 RF Automatic Matcher Product Features
Введение: DAIHEN 2L39-000158-V3 is a specialized RF matching device for semiconductor etching and coating equipment, which can quickly adjust impedance and stabilize plasma processes.
Automatic real-time matching of load impedance, low RF transmission loss
Fast tuning response to adapt to dynamic changes in cavity impedance
Significantly reduce reflected power and protect the RF power supply host
Compatible with standard industrial RF frequencies and mainstream processes
Built in air-cooled heat dissipation, long-term full load operation without overheating
High voltage insulation protection to avoid RF leakage faults
Оригинальный заводской стандартный интерфейс, can directly replace spare parts of the same specification

Real time signal feedback for easy monitoring of machine system status
Компактный модульный корпус, экономия места для установки внутри устройства
Corrosion resistant internal components, resistant to process corrosive gas environments
Multiple fault protection, automatic shutdown warning for overheating and overcurrent
Низкая вибрация во время работы, does not interfere with precision semiconductor processes
Standardized communication protocol, integrated with TEL equipment control system
High durability adjustable capacitors and inductors, with longer maintenance cycles
The clean workshop is equipped with a sealed structure to prevent dust, water, and steam from entering
Заключение: DAIHEN 2L39-000158-V3 has precise matching and complete protection, and is the core RF matching component of plasma semiconductor equipment.

Подробные фотографии продукта：

2L39-000158-V3

видео о продукте

Другие ссылки

SEW DFS56L-TF-RH1M-KK伺服电机
NI SCXI-1104C数据采集模块
3BHE032025R0101 PCD235A101励磁机控制模块

Другие ссылки

07Логический контроллер KT94 L GJR5252100R0161
Б&Р 8ЛСА35. E2060D000-0 серводвигатель
GDC801A 3BHE0247R0101 Плата управления