AMAT 0010-02977 RF Matcher

Product Manual：

Main features (15 points)
AMAT original PVD dedicated, compatible with Sub Zero BESC cavity, strong compatibility.
13.56MHz standard RF frequency, matched with mainstream semiconductor sputtering power supply.
Automatic impedance matching network, real-time dynamic tuning, millisecond level response.
50 Ω standard impedance, seamlessly integrated with RF power supply/cavity.
Maximum power processing of 3kW, meeting the requirements of high-power sputtering process.
Built in high-precision V/I sensor for precise monitoring of reflected power.
Closed loop stepper motor drive, automatic adjustment of variable capacitance, stable matching.
Low reflection design, suppresses standing waves, and protects the RF generator and cavity.
Vacuum chamber side installation, compact structure, simple wiring.
Industrial grade water-cooled heat dissipation, long-term stable operation under high power.
Multiple fault protection: overvoltage, overcurrent, overheating, standing wave protection.
Compatible with Endura platform, specifically designed for PVD (TiN/Al/Cu) process.
Original factory spare parts standard, can be directly replaced, easy to maintain.
All metal shielding, good EMI/RFI suppression, strong anti-interference.
Semiconductor FAB certification, cleanroom level adaptation, long lifespan.

Product detailed pictures：

0010-02977

product video

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