AMAT 0090-05537 Flow Controller

Product Manual：

AMAT 0090-05537 is an MFC mass flow controller for semiconductor machine applications, which accurately controls the process gas flow rate
1. AMAT 0090-05537 original compatible with AMAT etching and thin film deposition wafer equipment
2. Closed loop PID regulation, stable control of special process gases such as nitrogen and argon
3. High flow measurement accuracy ensures wafer process consistency
4. Built in sensor feedback, real-time upload of traffic data to the main controller
5. Anti RF plasma interference, suitable for cavity RF process environment
6. Stainless steel clean chamber, no impurities contaminating the wafer
7. Quick response adjustment, no significant fluctuations in traffic switching

8. Multiple overvoltage and overcurrent safety interlock protection
9. Standard gas path connector, easy disassembly and assembly of pipelines without air leakage
10. Electrical interface gold-plated, stable contact during long-term operation
11. Equipped with a fault indicator light, it can quickly identify abnormal flow
12. Supports digital/analog dual signal communication and interfaces with device motherboards
13. Temperature resistant and earthquake resistant, suitable for continuous production of 7 × 24 hours on the production line
14. Board anti-corrosion coating, resistant to trace corrosive process gases
15. Original industrial components with low long-term operation failure rate
Conclusion: AMAT 0090-05537 has precise flow control and strong stability, and is a core component of semiconductor process gas circuits

Product detailed pictures：

0090-05537

product video

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