Edwards A53351945XS dry pump  

Product Manual：

#Edwards A53351945XS dry pump

1. Primary rough vacuum operation of semiconductor process chamber
2. Pre pumping of the pre stage of the turbo molecular pump establishes negative pressure in the early stage
3. Pre extraction and emission of process gas in the chamber of dry etching machine
4. PECVD coating equipment chamber quickly evacuates upon startup
5. Rough pumping operation of helium mass spectrometer leak detection system for wafers
6. ALD atomic layer deposition equipment standby vacuum maintenance
7. Remote plasma cleaning equipment pre extraction and pressure stabilization
8. Ion implantation machine chamber pressure relief and pre extraction operation

9. Daily rough pumping maintenance of chip packaging vacuum chamber
10. Photovoltaic thin film deposition chamber can quickly remove the atmosphere when turned on
11. Evacuate and replace the cavity before and after replacing the vacuum probe station
12. Pre pumping operations for various vacuum chambers in the laboratory
13. Preliminary extraction and transportation of process waste gas to exhaust gas treatment device
14. Internal replacement and removal of air impurities in clean air pipelines
15. This Edwards A53351945XS dry pump has an oil-free lubrication structure, which does not produce oil pollution to the vacuum chamber and is resistant to slight process dust corrosion
In summary, Edwards A53351945XS has high pumping efficiency, easy operation and maintenance, and is suitable for continuous rough pumping operations in semiconductor clean processes around the clock.

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