Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump   

Product Manual：

#Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump

1. High vacuum extraction of wafer PVD coating chamber
2. Dry etching equipment maintains a process vacuum environment
3. Stable pumping operation of ion implantation machine chamber
4. Scanning electron microscopy analysis chamber construction of clean vacuum
5. Internal vacuum extraction operation of mass spectrometry detection instrument
6. Vacuum pumping for ALD atomic layer deposition equipment
7. Continuous voltage stabilization of vacuum chamber in chip packaging process
8. Vacuum and dehumidification of optical coating equipment chamber

9. Helium mass spectrometry leak detection system with high vacuum end pumping
10. Third generation semiconductor experimental vacuum chamber pumping
11. Pre vacuum extraction of electron beam welding chamber
12. Vacuum maintenance of photovoltaic thin film deposition chamber
13. PT66-1Z-000 Vacuum heat treatment and evacuation of laboratory materials
14. Vacuum probe station testing chamber pumping and stabilizing pressure
15. This Edwards PT66-1Z-000 semiconductor turbo molecular pump is clean and oil-free, with smooth pumping speed, suitable for dust-free semiconductor process scenarios
Overall, Edwards PT66-1Z-000 has strong dust resistance, low operating noise, and can operate continuously and stably for a long time.

Product detailed pictures：

PT66-1Z-000

product video

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