MKS GHG5013A-002 RF Generator  

Product Manual：

MKS GHG5013A-002 RF Generator
1. Solid state RF power architecture, operating frequency 13.56MHz, suitable for semiconductor plasma processes
2. Power closed-loop control ensures stable output power when the load changes
3. 19 inch rack installation, easy disassembly, replacement, and maintenance of cabinets
4. Real time collection of forward power and reflected power, monitoring of load matching status
5. Built in multiple hardware protections for overheating, overcurrent, overvoltage, and load mismatch
6. Supports both continuous and pulse RF output modes, with adjustable duty cycle
7. Low harmonic output reduces RF interference on peripheral board signals
8. Water cooling heat dissipation method, supporting long-term high-power continuous operation

9. The local panel can read operating parameters such as power, alarms, fault codes, etc
10. RS232 communication interface, supporting remote control and parameter reading from the upper computer
11. Comes with fault log storage for easy troubleshooting of process abnormalities
12. Electrical isolation signal interface to reduce external circuit interference and impact
13. 24VDC auxiliary power supply, compatible with semiconductor equipment cabinet power supply system
14. Wide temperature working range, capable of withstanding high temperature environments inside equipment cabinets
15. RF matching device is required for etching and thin film deposition plasma processes
MKS GHG5013A-002 RF generator, semiconductor process RF power source, used in wafer etching, plasma cleaning, and thin film deposition equipment

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