TMP-H3603LMC-A1 Turbomolecular Pump
Product Manual：
#TMP-H3603LMC-A1 Turbomolecular Pump
1. Semiconductor dry etching chamber maintains ultra-high vacuum environment
2. Stable pumping and pressure stabilization during PECVD thin film deposition process on wafers
3. PVD sputtering coating chamber continuously extracts clean high vacuum
4. Vacuum construction of ALD atomic layer deposition process chamber
5. Remote plasma cleaning equipment with vacuum pumping operation
6. Long term vacuum maintenance of ion implantation machine process chamber
7. High vacuum end pumping operation of wafer helium mass spectrometer leak detector
8. Vacuum pumping process for third-generation semiconductor samples
9. Extraction of water vapor and impurity gases from the cavity of optical coating machine
10. Scanning electron microscopy and mass spectrometry analysis instruments with built-in vacuum extraction
11. Stable negative pressure guarantee for chip packaging vacuum chamber
12. Vacuum control of photovoltaic thin film deposition production line cavity
13. Evacuation of laboratory material vacuum heat treatment chamber
14. Vacuum probe table crystal circle testing chamber pressure stabilization and pumping
15. This TMP-H3603LMC-A1 is a Shimadzu magnetic levitation water-cooled molecular pump, which has oil-free and clean pumping, extremely low vibration, and is suitable for semiconductor high cleanliness and harsh working conditions
Overall, TMP-H3603LMC-A1 is corrosion-resistant, runs smoothly, and can operate continuously 24/7, providing stable output of ultra-high vacuum required for the process.
Product detailed pictures：
TMP-H3603LMC-A1
product video
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