ADVANCED ENERGY 3151801-004 Удаленный источник плазмы
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ADVANCED ENERGY 3151801-004 Remote Plasma Source Product Features
ADVANCED ENERGY 3151801-004 is a 6KW remote plasma cleaning source suitable for semiconductor etching and deposition equipment, used for chamber cleaning and exhaust gas treatment. It has strong process adaptability and the following characteristics:
Integrated power module, eliminating the need for separate power supply installation
Built in solid-state active matching network, with a wide range of impedance adaptation
High purity anodized aluminum cavity, corrosion-resistant and not easy to remove impurities
High gas dissociation efficiency, significantly reducing the consumption of cleaning consumables
Specialized pulse ignition structure, capable of stable ignition even in low-temperature chillers
Circulating water-cooled heat dissipation structure, stable temperature control during long-term operation
Compatible with various process gases such as NF3, oxygen, argon, и т. д.
Multiple current and voltage protection, automatic shutdown protection under abnormal working conditions
Standard industrial communication interface, capable of interfacing with equipment master control linkage
Built in real-time monitoring circuit, synchronized feedback of power and pressure data
Compact rack mounted structure, occupying minimal space for cabinet installation
Plasma long-distance transportation to avoid wafer damage from sputtering
Continuous load operation at all times, compatible with 24-hour mass production lines
Equipped with a built-in fault diagnosis program, quickly locate ignition and water circuit faults
Original factory standardized size, same model spare parts can be directly replaced and used immediately
ADVANCED ENERGY 3151801-004 remote plasma source dissociation is stable and easy to maintain, making it the core supporting equipment for semiconductor thin film equipment cavity cleaning.
Подробные фотографии продукта：
3151801-004
видео о продукте
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