Передовая энергия 3153137-934 Удаленный источник плазмы
Руководство по продукту：
Передовая энергия 3153137-934 Удаленный источник плазмы
начало
Передовая энергия 3153137-934 is a remote plasma source specifically designed for the semiconductor industry, primarily used for chamber cleaning, exhaust gas treatment, and wafer surface pretreatment work.
девушка=”текстовая отметка для дрожжей” />>Особенности продукта
High gas decomposition efficiency, uniform and stable cleaning effect of the chamber
Built in impedance matching device, low RF power transmission loss
The ignition is stable and can start normally even under cold working conditions
Adopting water-cooled heat dissipation method, supporting long-term continuous operation of equipment
The cavity has undergone anti-corrosion treatment and is resistant to various process chemicals and gases
Equipped with multiple safety protection functions for overheating, перенапряжение, и перегрузка
Equipped with a universal communication interface, it can be connected to the upper system for remote control of parameters
Plasma remote action reduces damage to the inner wall of the cavity and particle generation
Compatible with multiple process gases and suitable for different semiconductor process scenarios
Equipped with running status monitoring function, it can quickly self check and troubleshoot faults
Integrated compact structure, easy and convenient on-site disassembly and replacement
Strong controllability of process parameters and excellent consistency in batch production
Sealed anti-static design to prevent static electricity from damaging internal precision components
Can effectively improve wafer processing yield and reduce equipment maintenance downtime
Widely adaptable to various semiconductor process equipment such as etching and thin film deposition
краткое содержание
Передовая энергия 3153137-934 remote plasma source has stable operation, excellent cleaning efficiency, and complete protection mechanism. It is an indispensable core spare part for cavity cleaning and exhaust gas treatment in the semiconductor production process, ensuring efficient and stable mass production of the production line.
Подробные фотографии продукта：
3153137-934
видео о продукте
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