МКС 0920-00057 plasma power module

Руководство по продукту：

#МКС 0920-00057 plasma power module

1. Remote plasma excitation power supply for semiconductor etching chamber
2. Wafer process chamber wall deposition impurity cleaning power supply drive
3. Plasma stable power supply for photoresist dry stripping process
4. Fluorine based process gas dissociation activation power supply
5. AMAT matching coating equipment cavity cleaning power supply
6. Third generation semiconductor epitaxial furnace chamber wall descaling power supply
7. Periodic purification and power supply for the cavity of the panel TFT production line
8. Decomposition of organic residues in perovskite photovoltaic cavities for power supply

9. Power supply for plasma treatment of trace pollutants on wafer surface
10. Quartz tooling plasma surface activation power supply
11. Power supply for cleaning metal residues inside PVD sputtering chamber
12. Pre treatment of plasma power supply in laboratory vacuum chamber
13. Purification and power supply of substrate surface before chip packaging
14. Power supply for peeling off excess dielectric film in optical coating cavity
15. This MKS 0920-00057 plasma power module has stable output power and is compatible with remote plasma sources to stably excite active free radicals
Общий, МКС 0920-00057 has precise power regulation, strong resistance to load fluctuations, multiple safety protections, and is suitable for long-term stable cavity cleaning operations in semiconductor production lines.

Подробные фотографии продукта：

0920-00057

видео о продукте

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