TEL 2L81-050097-V3 RF Controller  

Product Manual：

TEL 2L81-050097-V3 RF Controller
TEL 2L81-050097-V3 is suitable for RF control of semiconductor etching and deposition equipment
Accurately control RF power and stabilize the plasma state inside the cavity
Real time impedance matching to reduce RF reflection loss
Hardware signal isolation to resist workshop electromagnetic interference
Standard slot type board, easy to disassemble and replace
Wide temperature stable operation, suitable for clean workshop conditions
Real time collection of RF parameters, closed-loop process adjustment
Built in fault self check, quick alarm for RF abnormalities
Multiple signal channels, synchronized linkage RF power supply
Precise factory wiring with low signal loss

Seismic reinforcement structure, suitable for long-term vibration operation of equipment
Multi process parameter storage, no need to readjust when switching processes
Miniaturized board, saving installation space for control cabinets
Multiple overcurrent and overvoltage protection to prevent damage to RF components
Perfectly compatible with all TEL plasma process equipment in the range
Summary: TEL 2L81-050097-V3 RF controller has high regulation accuracy, anti-interference durability, and is the core control board of semiconductor plasma equipment RF system.

Product detailed pictures：

2L81-050097-V3

product video

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